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1 photoresist masking
фоторезистне маскуванняEnglish-Ukrainian dictionary of microelectronics > photoresist masking
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2 positive photoresist masking technique
метод фотолітографії на основі позитивного фоторезистаEnglish-Ukrainian dictionary of microelectronics > positive photoresist masking technique
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3 selective (photoresist) masking
вибіркове фоторезистне маскуванняEnglish-Ukrainian dictionary of microelectronics > selective (photoresist) masking
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4 selective (photoresist) masking
вибіркове фоторезистне маскуванняEnglish-Ukrainian dictionary of microelectronics > selective (photoresist) masking
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5 masking
1) маскування 2) літографія - dry masking
- metallization masking
- nitride masking
- optical masking
- oxidation masking
- oxide masking
- photo masking
- photoresist masking
- projection masking
- reticle masking
- selective photoresist masking
- selective masking
- silicon-dioxide masking
- wet masking -
6 photoresist
фоторезист; резист (див. т-ж resist) - Azoplate photoresist
- diazide photoresist
- double photoresist
- high performance photoresist
- insoluble photoresist
- hardened photoresist
- Kodac carbon photoresist
- masking photoresist
- negative-typephotoresist
- negativephotoresist
- novolak photoresist
- polymerized photoresist
- positive-typephotoresist
- positivephotoresist
- solid photoresist
- soluble photoresist
- spun-on photoresist
- striation-free photoresist
- ultrapure photoresistEnglish-Ukrainian dictionary of microelectronics > photoresist
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7 masking photoresist
фоторезистна маска, фоторезистний маскуючий шарEnglish-Ukrainian dictionary of microelectronics > masking photoresist
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8 technique
1) метод, спосіб (див. т-ж арproach, method) 2) технологія (див. т-ж technology) - alloying technique
- annular sawing technique
- assembly technique
- automatic layout technique
- automatic test generation technique
- BIMOS technique
- bond etchback technique
- boron etch stop technique
- bump-metallization technique
- CAD technique
- GDI technique
- chip floorplan technique
- chip processing technique
- circuit technique
- CMOS technique
- cold-crucible technique
- cold-processing technique
- collector-diffusion isolation technique
- commutating auto-zeroing technique
- computerized design technique
- CVD technique
- decomposition technique
- definition technique
- development advanced rate technique
- diffused planar technique
- diffusion technique
- double-diffusion technique
- dry processing technique
- electrochemical passivation technique
- electron-beam technique
- electroplating technique
- etch-and-refill technique
- etchback technique
- etch-stop technique
- evaporation technique
- fabrication technique
- film technique
- flip-chip technique
- floating crucible technique
- folding technique
- four-point probe technique
- growth technique
- implant-isolation technique
- incremental time technique
- integrated technique
- interconnection technique
- internal trace technique
- ion-implantation technique
- isolation technique
- laser selective photoionisation technique
- laser-trimming technique
- lifting technique
- lift-off technique
- light-scattering technique
- liquid encapsulation Czochralski technique
- liquid-phase epitaxy technique
- liquid epitaxy technique
- lithographic technique
- masked diffusion technique
- masking technique
- mask-making technique
- masterslice technique
- mesa-fabrication technique
- Minimod technique
- mixed-level technique
- mixed-mode technique
- modified horizontal Bridgman technique
- modified Bridgman technique
- molecular-beam epitaxy technique
- monolithic technique
- mounting technique
- multichip assembly technique
- multiwire technique
- native охide technique
- node tearing technique
- n-type doping technique
- open-tube diffusion technique
- open-tube technique
- optical alignment technique
- oxide masking technique
- oxygen-plasma охidation technique
- packaging technique
- peripheral sawing technique
- photolithographic technique
- photomasking technique
- photomechanical technique
- photoresist lift-off technique
- piecewise linear modeling technique
- planar-epitaxial technique
- plasma-охidation technique
- plasma-spraying technique
- p-n junction isolation technique
- positive photoresist masking technique
- probe technique
- processing technique
- production technique
- production soldering technique
- reduction technique
- resist technique
- SBC technique
- scaling technique
- screen-printing technique
- screen-stencil technique
- self-aligned double-diffusion technique
- serial-writing technique
- shallow V-groove technique
- shrinking technique
- silk-screeningtechnique
- silk-screentechnique
- single-layer interconnection technique
- single-level interconnection technique
- sinking technique
- slice technique
- solder reflow technique
- solute-diffusion technique
- SOS isolation technique
- sparse matrix technique
- staged-diffusion technique
- staining technique
- stencil technique
- step-and-repeat reduction technique
- tape-carrier technique
- test technique
- thermal wave technique
- trench-etch technique
- tri-mask technique
- trimming technique
- two-layer resist technique
- two-phase technique
- two-step technique
- vapor-oxidation technique
- vapor-phase epitaxial technique
- V-ATC technique
- wet technique
- wire-bonding technique
- wire-wrapping technique
- wire-wrap technique
- wiring technique
- 1:1 photomasking techniqueEnglish-Ukrainian dictionary of microelectronics > technique
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9 pattern
1. ім.1) малюнок; зображення; образ; рельєф2) конфігурація, форма2. дієсл. формувати малюнок; формувати зображення; формувати рельєф; структурувати - chip pattern
- circuit pattern
- computer-generated pattern
- conductive pattern
- conductor pattern
- contact pattern
- contiguous-disk propagation pattern
- customized metallization pattern
- discretionary wiring pattern
- dislocation pattern
- domain pattern
- dopant pattern
- electron-beam pattern
- electron diffraction pattern
- emitter pattern
- error-free layout pattern
- etchedpattern
- etchpattern
- fine-line pattern
- fine-linewidth pattern
- fixed-interconnection pattern
- gate pattern
- geometric pattern
- growth pattern
- high-aspect ratio pattern
- insulation pattern
- integrated-circuit pattern
- interconnection mask pattern
- layout pattern
- lead pattern
- mask pattern
- masked реrmalloy pattern
- masking pattern
- master pattern
- measurement pattern
- metal-finger pattern
- multiple pattern
- optical pattern
- oxide pattern
- permalloy propagation pattern
- photographic emulsion-maskpattern
- photographic emulsionpattern
- photoresist film pattern
- photoresist pattern
- photoresist mask pattern
- process evaluation and control pattern
- programmed-interconnection pattern
- regular pattern
- repetitive pattern
- reticle pattern
- routing pattern
- shifting test pattern
- silicon pattern
- step coverage pattern
- striation pattern
- subisolation pattern
- sunken охide pattern
- surface relief pattern
- test pattern
- thick-film pattern
- thin-film pattern
- transistor pattern
- wafer pattern
- wiring pattern -
10 material
матеріал - acceptor material
- adulterated semiconductor material
- base material
- binding material
- brittle material
- bubble material
- carrier material
- cermet material
- coarse-featured resist material
- composite material
- compound semiconductor material
- conductivity-type imparting material
- contact material
- contrast enhancing material
- dopant masking material
- doped material
- doping material
- electronic material
- electron resist material
- encapsulating material
- encapsulation material
- epitaxial material
- etchant masking material
- etching material
- evaporated material
- evaporation material
- filler material
- film material
- fine-featured resist material
- foreign material
- fragile material
- group III-V compound semiconductor material
- heavily doped material
- high-resistivity material
- host material
- impurity material
- laminated material
- liquid-crystal material
- lowly doped material
- low-resistivity material
- LSCO material
- magnetostrictive material
- mask-forming material
- mask material
- mismatched materials
- molding material
- multilayer material
- negative-image material
- organosilicone material
- packaging material
- parent material
- patterned material
- photoresist material
- photoresponsive material
- photosensitive material
- piezoelectric material
- plastic material
- polycrystalline material
- positive-image material
- refractory material
- resist material
- resistive material
- semiconductive material
- semiconductor material
- semiconductor-glass composite material
- silicon-on-insulator material
- silicon-on-sapphire material
- Si-MBE material
- single-crystal material
- spinel material
- starting material
- stop-etch material
- substrate material
- superconducting material
- support material
- thallium-based material
- thixotropic material
- virgin material
- Y–Ba–Cu–O material
- Y1–Ba2–Cu3–O7-x material
- 1-2-3 material -
11 process
1. ім.1) процес; (технологічний) метод, спосіб2) технологія (див. т-ж technique, technology)3) (технологічна) обробка; технологічна операція2. дієсл. обробляти; проводити технологічну операцію - all-ion-implant process
- all-planar process
- Auger process
- batch process
- BH bias and hardness process
- BH process
- bonding process
- BOX process
- bulk CMOS process
- bumping process
- chip-on-board process
- closed CMOS process
- CMOS-on-sapphire process
- composite сеll logic process
- contact process
- conventional process
- deep охide isolation process
- DIFET process
- diffused eutectic aluminum process
- direct synthesis and crystal pull process
- double-diffused process
- double ion-implanted process
- double-layer polysilicon gate MOS process
- double-layer polysilicon gate process
- epitaxial deposition process
- epitaxial process
- epitaxial growth process
- flip-over process
- floating-gate silicon process
- front-end process
- gold-doped process
- guard-banded CMOS process
- heterogeneous process
- high-voltage process
- HMOS process
- imaging process
- implantation process
- in-house process
- interconnection process
- inverted meniscus process
- ion plating process
- isoplanar -S, -Z, -2 process
- isoplanar process
- junction-isolated process
- laser-recrystallized process
- lithographic process
- low-pressure process
- low VT process
- lost wafer process
- major process
- masking process
- master slice process
- mesa-isolation process
- metal-gate MOS process
- metal-gate process
- microbipolar LSI process
- micrometer-dimension process
- mid-film process
- Minimod process
- Mo-gate MOS process
- Mo-gate process
- nitride process
- nitrideless process
- NSA process
- oxide-film isolation process
- oxide isolated process
- oxygen refilling process
- patterning process
- phosphorous buried-emitter process
- photoablative process
- photolithography process
- photoresist process
- planar oxidation process
- Planox process
- plasma etch process
- Poly I process
- Poly II process
- Poly 5 process
- poly-oxide process
- Poly-Si process
- polysilicon-gate process
- poly-squared MOS process
- proprietary process
- PSA bipolar process
- PSA process
- refractory metal MOS process
- refractory metal process
- sacrificial охide process
- sapphire dielectric isolation process
- scaled Poly 5 process
- screen-and-fire process
- selective field-охidation process
- self-aligned gate process
- self-aligned process
- self-registered gate process
- self-registered process
- semi-additive process
- semiconductor-thermoplastic-dielectric process
- semicustom process
- shadow masking process
- silk-screen process
- single poly process
- SMOS process
- SOS/CMOS process
- stacked fuse bipolar process
- Stalicide process
- step-and-repeat process
- subtractive-fabrication process
- surface process
- Telemos process
- thermal process
- thermally асtivated surface process
- thermal-охidation process
- three-mask process
- triple-diffused process
- triply-poly process
- twin-tub process
- twin-well process
- V-groove MOS process
- V-groove process
- wet process
- 3-D process
См. также в других словарях:
photoresist masking — maskavimas fotorezistu statusas T sritis radioelektronika atitikmenys: angl. photoresist masking vok. Maskierung durch Photoresist, f rus. маскирование фоторезистом, f pranc. masquage par photorésist, m … Radioelektronikos terminų žodynas
wet-photoresist masking — maskavimas skystuoju fotorezistu statusas T sritis radioelektronika atitikmenys: angl. wet photoresist masking vok. Naßmaskierung durch Photoresist, f rus. маскирование жидким фоторезистом, n pranc. masquage par photorésist liquide, m … Radioelektronikos terminų žodynas
masking photoresist — maskavimo fotorezistas statusas T sritis radioelektronika atitikmenys: angl. masking photoresist vok. photoresistive Maskierungsschicht, f rus. маскирующий фоторезист, m; маскирующий фоторезистный слой, m pranc. masquage à photorésist, m … Radioelektronikos terminų žodynas
Maskierung durch Photoresist — maskavimas fotorezistu statusas T sritis radioelektronika atitikmenys: angl. photoresist masking vok. Maskierung durch Photoresist, f rus. маскирование фоторезистом, f pranc. masquage par photorésist, m … Radioelektronikos terminų žodynas
masquage par photorésist — maskavimas fotorezistu statusas T sritis radioelektronika atitikmenys: angl. photoresist masking vok. Maskierung durch Photoresist, f rus. маскирование фоторезистом, f pranc. masquage par photorésist, m … Radioelektronikos terminų žodynas
Naßmaskierung durch Photoresist — maskavimas skystuoju fotorezistu statusas T sritis radioelektronika atitikmenys: angl. wet photoresist masking vok. Naßmaskierung durch Photoresist, f rus. маскирование жидким фоторезистом, n pranc. masquage par photorésist liquide, m … Radioelektronikos terminų žodynas
masquage par photorésist liquide — maskavimas skystuoju fotorezistu statusas T sritis radioelektronika atitikmenys: angl. wet photoresist masking vok. Naßmaskierung durch Photoresist, f rus. маскирование жидким фоторезистом, n pranc. masquage par photorésist liquide, m … Radioelektronikos terminų žodynas
masquage à photorésist — maskavimo fotorezistas statusas T sritis radioelektronika atitikmenys: angl. masking photoresist vok. photoresistive Maskierungsschicht, f rus. маскирующий фоторезист, m; маскирующий фоторезистный слой, m pranc. masquage à photorésist, m … Radioelektronikos terminų žodynas
maskavimas fotorezistu — statusas T sritis radioelektronika atitikmenys: angl. photoresist masking vok. Maskierung durch Photoresist, f rus. маскирование фоторезистом, f pranc. masquage par photorésist, m … Radioelektronikos terminų žodynas
маскирование фоторезистом — maskavimas fotorezistu statusas T sritis radioelektronika atitikmenys: angl. photoresist masking vok. Maskierung durch Photoresist, f rus. маскирование фоторезистом, f pranc. masquage par photorésist, m … Radioelektronikos terminų žodynas
maskavimas skystuoju fotorezistu — statusas T sritis radioelektronika atitikmenys: angl. wet photoresist masking vok. Naßmaskierung durch Photoresist, f rus. маскирование жидким фоторезистом, n pranc. masquage par photorésist liquide, m … Radioelektronikos terminų žodynas